الوصف
Allwin*1 Corp. is a
leading supplier of sputter deposition equipment for high
technology applications forSemiconductor III-V, II-VI, MEMS,
Biomedical, Nanotechnology, Solar, Battery & LED
industries.
The AccuSputter AW ***0 is designed for flexibility offering a
wide range of operating and process modes. The highest quality
construction, components and Allwin*1's new real time AW****0
System Control assure reliable operation and an ultra clean
vacuum environment to yield consistently reproducible results.
Every AccuSputter AW ***0 sputtering system is supported by years
of technological experience and backed by a worldwide sales and
service organization dedicated to prompt courteous
service
AccuSputter AW ***0 Proven
Sputter Materials:
Al+W ,Cr/SiO2, SiC
,Ti+Au,InSnO ,SiO2 ,Ti/W ,Ti+Au+Ni,Al2O3 ,Mo ,SiO2+O2
,Ni/Fe+Cu+SiO2,Ag MoSi2 ,Si+N2(Si3N4) ,Ti/W+Au,Au ,Mo2Si5
,Si+N2+B4C, Ti/W+Au+Ta, C, Mo5Si3 ,Ta ,Ti/W+Al/Si,Cr Ni ,TaC,
Ti/W+Ni/Cr+Au,Cr/Co ,Ni/Cr, Ta+Au , Ti/W+Pt,Cr/Au, Ni+Ni/Cr,
TaSi2 ,Al+Ti/W+Ag, Cr+Cu, Ni/Fe ,Ta+SiO2 , W+Al2O3,Cr/Si ,Pt, Zr
,Zn,Cr/SiO, TiO2 ,TiO2+Cr, ZnO2
AccuThermo AW ***0 Sputter Key
Features:
-
Production-proven
sputter technology
-
Optimum AW****0
System Control
-
DC *4V for Motors,
Actuator, Relay, Solenoid
-
Efficient 8" Delta
cathodes, 2 to 6" option
-
Full Pallet
rotation control with indexing
-
High Uniformity and
Yield
-
DC, RF Sputter,
Pulse DC option
-
Magnetron and Diode
Sputter option
-
RF Etch and Bias
are optional
-
Ultra Clean vacuum
system
-
Load lock
operation
-
UHV design
-
Flexible for
development or production use
-
Full range of
substrate sizes and shapes
-
Various pumping and
power options
-
Co-sputtering
option
-
Reactive Sputtering
option
-
Made in
U.S.A.
AccuSputter AW ***0 Sputter
Software Key Features:
-
Maintenance,
Manual, Semi Automatic and Fully Automatic modes.
-
Automated
calibration of all subsystems.
-
Troubleshooting to
subassembly levels.
-
Programmed
comprehensive calibration and diagnostic functions.
-
Recipe creation for
full automatic wafer processing.
-
Automatic decline
of improper recipes and process data s.
-
Multi-level
password protection.
-
Storage of multiple
recipes and system functions.
-
Real-Time process
graphics, data acquisition display, and analysis.
-
Process Data and
Recipe storage automatically to hard drive.
-
Easy TC vacuum
gauge calibration.
-
Positioning
Deposition (optional)
-
GEM/SECS II
(optional)
AccuSputter AW ***0
Configuration:
-
Main Frame
-
*8" dia. SST
chamber top plate with ports for *-inch(4) circle or Delta
(3) Cathodes
-
Sputter Power
Supply,DC or RF or Pulse DC power, RF: **3KW; DC: 5KW or
*0KW
-
Process
Chamber
8" diameter X *2"
high stainless steel cylinder with 6"
CF flange viewport and
load lock port
*8" diameter stainless
steel base plate
*1/2" air-operated
roughing isolation valve
Air-operated gas inlet
valve
Air-operated vent
valve
*1/2"blanked-off leak
check port
Removable deposition
shields
*3" diameter,
*-position water-cooled annular substrate table with variable-speed
motorized table drive
Full circle shutter and
vane shutter
Chain drive pallet
carrier transport
Heavy duty electric
hoist
*0" x *8" x 8"
stainless steel load lock chamber with aluminum cover
Chain drive pallet
carrier transport
2" air-operated
roughing isolation valve
Air-operated vent
valve
*3" diameter molybdenum
annular substrate pallet
Elevator for pallet up
and down function.
-
Vacuum Systems for
process Chamber
2 stage Cryo pump
with ***0 l/s pumping speed for air, including chevron,
water-cooled compressor and lines, automatic regeneration
controller and plumbing kit. *1/2" O.D. (6" ASA) aluminum
air-operated gate valve Air-operated venetian blind throttling
valve.
*6.7 cfm mechanical
pump or dry pump for process chamber and load lock (Optional)
-
1 gas line with
MFC(Ar, **0 SCCM or Customized)
-
New Controller:
Allwin*1 Corp.'s AW****0 System PC Control
-
New Power
Distribution Box: AC**0V /**8V/ 3Phase
AccuSputter AW ***0 Sputter
Options:
-
GEM/SECS II
function (Software)
-
More gas lines with
MFC(â‘
N2;â‘¡ O2;â‘¢ Customized)
-
Lamp tower alarm
with buzzer.
-
Mechanical pump or
dry pump for process chamber and load lock.
-
Independent
mechanical pump or dry pump for process chamber.
-
Chiller for Cooling
plates and table.
-
Turbo pump for load
lock.
-
Load lock Lamp
Heating function, Up to **0°C
-
Chamber Lamp
Heating function, Up to **0°C (Use one cathode port in SST
chamber top plate).
-
Plasma etch
function (before sputter)
-
Bias
function
-
Co-sputter
function
-
Reactive sputter
function
-
Transformer for AC
**0V to **8V for DC Power Supply (if necessary).
بلد: |
USA |
نموذج رقم: |
AccuSputter AW 4450
|
سعر فوب: |
200000 ~ 350000 / Unit ( Negotiable ) (قابل للتفاوض)
أحصل على آخر سعر
|
الموقع: |
- |
سعر الحد الأدنى للطلب: |
200000 per Unit |
الحد الأدني للطلب: |
1 Unit |
تفاصيل التغليف: |
Standard Crating |
موعد التسليم: |
4-8 weeks |
القدرة على التوريد: |
200 Set per Year |
نوع الدفع: |
Other, L/C, T/T |
مجموعة المنتج : |
Sputtering Deposition
|