الوصف
Allwin*1 Corp. is a
leading supplier of sputter deposition equipment for high
technology applications forSemiconductor III-V, II-VI, MEMS,
Biomedical, Nanotechnology, Solar, Battery & LED
industries. The
AccuSputter AW ***0 is designed for flexibility offering a wide
range of operating and process modes. The highest quality
construction, components and Allwin*1's new real time AW****0
System Control assure reliable operation and an ultra clean vacuum
environment to yield consistently reproducible results. Every
AccuSputter AW ***0 sputtering system is supported by years of
technological experience and backed by a worldwide sales and
service organization dedicated to prompt courteous
service
AccuSputter AW ***0 Proven Sputter
Materials:
Al+W ,Cr/SiO2, SiC
,Ti+Au,InSnO ,SiO2 ,Ti/W ,Ti+Au+Ni,Al2O3 ,Mo ,SiO2+O2
,Ni/Fe+Cu+SiO2,Ag MoSi2 ,Si+N2(Si3N4) ,Ti/W+Au,Au ,Mo2Si5
,Si+N2+B4C, Ti/W+Au+Ta, C, Mo5Si3 ,Ta ,Ti/W+Al/Si,Cr Ni ,TaC,
Ti/W+Ni/Cr+Au,Cr/Co ,Ni/Cr, Ta+Au , Ti/W+Pt,Cr/Au, Ni+Ni/Cr, TaSi2
,Al+Ti/W+Ag, Cr+Cu, Ni/Fe ,Ta+SiO2 , W+Al2O3,Cr/Si ,Pt, Zr
,Zn,Cr/SiO, TiO2 ,TiO2+Cr, ZnO2
AccuThermo AW ***0 Sputter Key
Features:
- Production-proven sputter
technology
- Optimum AW****0 System
Control
- DC *4V for Motors, Actuator, Relay,
Solenoid
- Efficient 8" Delta cathodes, 2 to
6" option
- Full Pallet rotation control with
indexing
- High Uniformity and
Yield
- DC, RF Sputter, Pulse DC
option
- Magnetron and Diode Sputter
option
- RF Etch and Bias are
optional
- Ultra Clean vacuum
system
- Load lock operation
- UHV design
- Flexible for development or
production use
- Full range of substrate sizes and
shapes
- Various pumping and power
options
- Co-sputtering option
- Reactive Sputtering
option
- Made in U.S.A.
AccuSputter AW ***0 Sputter
Software Key Features:
- Maintenance, Manual, Semi Automatic
and Fully Automatic modes.
- Automated calibration of all
subsystems.
- Troubleshooting to subassembly
levels.
- Programmed comprehensive
calibration and diagnostic functions.
- Recipe creation for full automatic
wafer processing.
- Automatic decline of improper
recipes and process data s.
- Multi-level password
protection.
- Storage of multiple recipes and
system functions.
- Real-Time process graphics, data
acquisition display, and analysis.
- Process Data and Recipe storage
automatically to hard drive.
- Easy TC vacuum gauge
calibration.
- Positioning Deposition
(optional)
- GEM/SECS II
(optional)
AccuSputter AW ***0
Configuration:
- Main
Frame
- *8" dia. SST
chamber top plate with ports for *-inch(4) circle or Delta (3)
Cathodes
- Sputter Power
Supply,DC or RF or Pulse DC power, RF: **3KW; DC: 5KW or
*0KW
- Process
Chamber
8" diameter X *2" high
stainless steel cylinder with 6"
CF flange viewport and
load lock port
*8" diameter stainless
steel base plate
*1/2" air-operated
roughing isolation valve
Air-operated gas inlet
valve
Air-operated vent
valve
*1/2"blanked-off leak
check port
Removable deposition
shields
*3" diameter,
*-position water-cooled annular substrate table with variable-speed
motorized table drive
Full circle shutter and
vane shutter
Chain drive pallet
carrier transport
Heavy duty electric
hoist
*0" x *8" x 8"
stainless steel load lock chamber with aluminum cover
Chain drive pallet
carrier transport
2" air-operated
roughing isolation valve
Air-operated vent
valve
*3" diameter molybdenum
annular substrate pallet
Elevator for pallet up
and down function.
- Vacuum Systems for
process Chamber
2 stage Cryo pump with
***0 l/s pumping speed for air, including chevron, water-cooled
compressor and lines, automatic regeneration controller and
plumbing kit. *1/2" O.D. (6" ASA) aluminum air-operated gate valve
Air-operated venetian blind throttling valve.
*6.7 cfm mechanical
pump or dry pump for process chamber and load lock (Optional)
- 1 gas line with
MFC(Ar, **0 SCCM or Customized)
- New Controller:
Allwin*1 Corp.'s AW****0 System PC Control
- New Power
Distribution Box: AC**0V /**8V/ 3Phase
AccuSputter AW ***0 Sputter
Options:
- GEM/SECS II
function (Software)
- More gas lines with
MFC(â‘
N2;â‘¡ O2;â‘¢ Customized)
- Lamp tower alarm
with buzzer.
- Mechanical pump or
dry pump for process chamber and load lock.
- Independent
mechanical pump or dry pump for process chamber.
- Chiller for Cooling
plates and table.
- Turbo pump for load
lock.
- Load lock Lamp
Heating function, Up to **0°C
- Chamber Lamp
Heating function, Up to **0°C (Use one cathode port in SST chamber
top plate).
- Plasma etch
function (before sputter)
- Bias
function
- Co-sputter
function
- Reactive sputter
function
- Transformer for AC
**0V to **8V for DC Power Supply (if necessary).
بلد: |
USA |
نموذج رقم: |
AccuSputter AW 4450
|
سعر فوب: |
200000 ~ 350000 / Unit ( Negotiable ) (قابل للتفاوض)
أحصل على آخر سعر
|
الموقع: |
- |
سعر الحد الأدنى للطلب: |
200000 per Unit |
الحد الأدني للطلب: |
1 Unit |
تفاصيل التغليف: |
Standard Crating |
موعد التسليم: |
4-8 weeks |
القدرة على التوريد: |
200 Set per Year |
نوع الدفع: |
Other, L/C, T/T |
مجموعة المنتج : |
Sputtering Deposition
|