High Temperature Diffusion / Oxydation Furnace

الوصف

1 General

l                   Type

M*****4WP/UM

l                   System

The system modules including:

(1) Tube furnace heating system

(2) Wafer transmission area

(3) Gas system

(4) Scavenger

(5) Protect system

(6) PC Control system

l                   Standard batch size

One tube of the equipment has the following batch sizes and capacity:

(1) Wafers **5×**5: **0

(2) Wafers **6×**6: **0

l                   Gross Throughput

For One *-stack equipment:

(1) Wafers **5×**5: ***0 pieces/h

(2) Wafers **6×**6: ***0 pieces/h

l                   Diffusion type

Close tube

l                   Automation(boat, wafer handling)

(1) Process boats: manual or automatic

(2) Wafer: manual

Main function & characteristics

1、Elaborate soft landing loading framework and closed tube diffusion, which can effective to prevent non-clean substances contaminate the quartz tube.

2、Adopting the automatic furnace door system design, well sealed performance prevents the harmful gas from leaking, also can saves running cost because the lower thermal losses and fewer gaseous sources consumes.

3、The better stability of temperature is proved by high-precision temperature control system.

4、The clean diffusion extends the cleaning-circle of quartz tube, and obviously improves the availability factor of this equipment.

5、Two-dimensional motion installment makes the conveying of oar more flexible and sophisticated.

6、Longer length of uniformity flat temperature zone, larger output.

7、The process is carried out by the intelligence-control system. On line monitoring, parameter editing, process curve and the equipment state showing by the industrial-class touch screen, easy to use!

8、Modularization and normalization design. All key parts are adopting the high quality import components, which can improve the reliability and stability of equipment.

Equipment size (Three tubes)

Outline dimensions