الوصف

 Indium Gallium Zinc Oxide (Ga2O3 / In2O3 / ZnO, IGZO) sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications

TYR material supply all kinds of ceramic sputtering target , compound semiconductor target include Oxide sputtering target , Fluoride sputtering target , Boride sputtering target , Carbide sputtering target , Nitride sputtering target , Sulfide sputtering target , Selenide sputtering target , Silicide sputtering target , Telluride sputtering target , Antimonide sputtering target , Arsenide sputtering target ......

The available made method include hot pressing , HP, , hot/cold isostatic pressing , HIP, CIP, , and vacuum melting, vacuum sintering

Spec.: Diameter: **5.6mm , *4",  max. Single piece Size: Length: 1mm, if larger size than this, we can do it as tiles joint by *5 degree or *0 degree.

Shape:  discs, plate, rod, tube, sheet, Delta, Rotatable and per drawing

TYR will base on each different material to select the best way to made it and sure the finish ceramic sputtering target  to be best.

Oxide Ceramic sputtering target :

Aluminum  Oxide , Al2O3             Antimony  Oxide , Sb2O3     

Antimony:Tin Dioxide , Sb:SnO, ATO    Barium Titanate , BaTiO3   

Bismuth Oxide , Bi2O3               Cerium oxide , CeO2       

Cerium fluoride , CeF3               Chromium Oxide ,CrO, Cr2O3    

Copper Oxide , CuO                 Dysprosium Oxide , Dy2O3   

Erbium Oxide , Er2O3               Eur  Oxide , Eu2O3

Gadolinium Oxide , Gd2O3           Hafnium Oxide, HfO2     

Holmium Oxide , Ho2O3             Indium Tin Oxide, In2O*-SnO2, ITO      

Indium Zinc Oxide, In2O*-ZnO, IZO   Indium Oxide , In2O3      

Indium Gallium Zinc Oxide, IGZO , In2O3+Ga2O3+ZnO       

Iron Oxide , Fe2O3, Fe3O4           Lanthanum Aluminate , LaAl2O3,    

LSMO ,  La0.*7Sr0.*3MnO3      

Lead  Zirconate , PbZrO3            Lead Oxide, PbO   

Lead Titanate , PbTiO3                Lead Zirconate , PbZrO3      

Lead Zirconate-Titanate, PZT , PbZrO3 + PbTiO3   

Lutetium Oxide , Lu2O3 

Magnesium Oxide , MgO              Molybdenum Oxide , MoO

Molybdenum Oxide , MoO3,            Neodymium Oxide , Nd2O3,     

Nickel Oxide, NiO                    Niobium Pentoxide , Nb2O5, Nb2Ox  

Neodymium Oxide , Nd2O3,            Nickel Oxide, NiO    

Praseodymium Oxide , Pr6O*1,          Samarium Oxide , Sm2O3     

Scandium Oxide , Sc2O3                Silicon Monoxide , SiO 

Silicon Dioxide , SiO2                  Strontium Titanate , SrTiO3,     

Tantalum Pentoxide , Ta2O5,            Terbium Oxide , Tb4O7   

Thulium Oxide , Tm2O3               Titanium Oxide , Ti2O3, Ti3O5

Titanium Monoxide , TiO                Titanium Dioxide , TiO2 

Tungsten Oxide , WO3, WO2.9, WO3 doped Li2O  

Vanadium Pentoxide , V2O5, VO2        Yttrium Oxide , Y2O3  

Ytterbium Oxide , Yb2O3      

Zinc Oxide , ZnO                     Zinc Aluminum Oxide, AZO , Al2O*-ZnO, ZnO-Al

Ga2O3 doped ZnO , GZO               Zirconium oxide , ZrO2     

ZrO2 - Y2O3 stabilized , YSZ,           ZrO2 + SiO2

Fluoride Ceramic sputtering target   

Aluminum Fluoride , AlF3 target     

Barium Fluoride , BaF2 target   

Cadmium Fluoride , CdF2 target      

Calcium Fluoride, CaF2 target     

Cerium Fluoride , CeF3 target   

Dysprosium Fluoride , DyF3 target

Erbium Fluoride , ErF3 target      

Lanthanum  Fluoride, LaF3 target     

Lithium Fluoride , LiF target 

Magnesium Fluoride, MgF2 target   

Neodymium Fluoride, NdF3 target    

Potassium Fluoride , KF, target      

Praseodymium Fluoride , PrF3 target     

Lead Fluoride , PbF2 target   

Sodium Fluoride , NaF target    

Strontium Fluoride , SrF3 target    

Samarium Fluoride , SmF3 target

Cryolite Na3AlF6 target       

Ytterbium  Fluoride , YbF3 target     

Yttrium Fluoride , YF3target

Boride Ceramic sputtering target   

Chromium Boride , Cr2B, CrB2, CrB, Cr5B3 target      

Hafnium Boride , HfB2 target      

Iron Boride , FeB target      

Lanthanum Boride , LaB6 target      

Molybdenum Boride , Mo2B, Mo2B5 target      

Neodymium Boride , NdB, NdB2 target      

Tantalum Boride , TaB, TaB2 target      

 Titanium Boride, TiB2 target      

Tungsten Boride , WB, WB2, W2B5 target      

Vanadium Boride , VB, VB2 target      

 Zirconium Boride , ZrB2 target  

Carbide Ceramic sputtering target  

Boron Carbide, B4C target    

Chromium Carbide , Cr3C2, CrC target     

Hafnium Carbide, HfC target    

Molybdenum Carbide , Mo2C target     

Niobium Nitride , NbC target    

Silicom Carbide , SiC target     

Tantalum Carbide , TaC target     

Titanium Carbide, TiC target    

Titanium Carbon Nitride , TiCN target       

Tungsten Carbide , W2C, WC target      

Tungsten Carbide Doped with Nickel , WC+Ni target     

Tungsten Carbide Doped with Cobalt , WC+Co target      

Vanadium Carbide , VC target    

Zirconium Carbide, ZrC target 

Nitride Ceramic sputtering target  

Aluminum Nitride , AlN target    

Boron Nitride, BN target   

Hafnium Nitride, HfN target     

Niobium Niride , NbN target      

Silicom Nitride , Si3N4 target      

Tantalum Nitride , TaN target      

 Titanium Carbon nitride , TiCN target    

Titanium Nitride, TiN target     

Vanadium Nitride , VN target     

Zirconium Nitride , ZrN target

Sulfide Ceramic sputtering target 

Cadmium  Sulfide , CdS target      

Copper Sulfide, CuS,Cu2S target      

Indium Sulfide , In2S3 target      

Iron Sulfide, FeS, FeS2 target      

Lead Sulfide , PbS target      

Manganese Sulfide, MnS2 target      

Molybdenum Sulfide , MoS2 target      

Niobium Sulfide , NbS2 target      

Silver Sulfide , AgS. Ag2S target      

Tantalum Suflfide , TaS2 target      

Tin Sulfide , SnS, SnS2 target      

Tungsten Sulfide , WS2 target      

Zinc Sulfide , ZnS target  

Silicide Ceramic sputtering target  

Chromium Silicide , CrSi2 target      

Cobalt Silicide , Co3Si target      

Hafnium Silicide , HfSi2 target      

Molybdenum silicide, MoSi2, Mo5Si3 target      

Nickel Silicide , NiSi target      

Niobium Silicide , Nb5Si3, NbSi2 target      

Tantalum Silicide , Ta5Si3, TaSi2 target      

Titanium silicide, Ti5Si3, TiSi2 target      

Tungsten Silicide , WSi2 target      

Vanadium silicide , V3Si, VSi2 target      

Zirconium Silicide , ZrSi2 target     

Selenide Ceramic sputtering target  

Aluminum Selenide , Al2Se3 target      

Antimony Selenide , Sb2Se3 target      

Arsenic Selenide , As2Se3 target      

Bismuth Selenide,  Bi2Se3 target      

Cadmium Selenide , CdSe target      

Copper Selenide, CuSe, Cu2Se target      

Gallium Selenide, Ga2Se3 target      

Gernium Selenide, GeSe  target      

Indium Selenide, In2Se3 target      

Lead Selenide, PbSe target      

Molybdenum Selenide, MoSe2 target      

Manganese Selenide, MnSe target      

Niobium Selenide , NbSe2 target      

Tantalum Selenide , TaSe2 target      

Tungsten Selenide , WSe2 target      

Zinc Selenide , ZnSe target  

Antimonide sputtering target 

Indium Antimonide , InSb target     

Gallium Antimonide , GaSb target      

Nickel Antimonide , NiSb target  

Arsenide sputtering target  

Indium Arsenide , InAs target      

Tin Arsenide , SnAs target      

Gallium Arsenide , GaAs target      

Telluride sputtering target  

Arsenic Telluride , As2Te3 target     

Antimony Telluride, SbTe, Sb2Te3 target      

Bismuth Telluride , Bi2Te3, BiTe target 

Bismuth Antimony Telluride , Bi-Sb-Te target

Cadmium Telluride, CdTe target      

Copper Telluride , CuTe, Cu2Te target     

Gallium Telluride , GaTe target      

Geranium Telluride , GeTe target     

Geranium Antimony Telluride , Ge-Sb-Te target      

Lead Telluride , PbTe target  

Tin Telluride, SnTe target

Molybdenum Telluride, MoTe2 target      

Niobium Telluride, NbTe2 target      

Silver Telluride, Ag2Te target     

Tantalum Telluride, TaTe2 target      

Tungsten Telluride , WTe2, sputtering target      

Zinc Telluride , ZnTe target