Aluminum Sputtering Target ----- Al target

Al    target       (Mat-cn)

Physical properties

Color

sliver

Density

2.**2g/m³

Melting point

***7

Technical indicators

purity

*9.*9%

Relative density

>*9%

Cut surface flatness

3.2Ra

Tolerance

±0.1mm

grain size

uniform

Material

Al Aluminum

  AlBrand

MAT-CN

Origin

Nanchang Jiangxi

Specifications

Size *1: diameter <**0mm thickness> 1 mm (wafer / round table / rod)

Size *2: length <**0mm width <**0mm thickness> 1mm rectangular / sheet / step-like (splicing)

Size *3: outer diameter <**0mm inner diameter> 1mm wall degree> 1 mm length> 1 mm (pipe / ring / rotatable targets)

Size *4 :: be customized according to user needs, sample processing, to map processing

Minimum order quantity

1, large concessions

Supply capacity

the same batch, the same material, continuous and reliable supply; **0 kg / month min

Delivery time

a single sheet of material 1 week delivery, bulk material *0 days **0 days delivery(working days)

Production process

vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments

various models magnetron sputtering equipment, etc.

Product uses

industrial-grade coating, experiments or research level Au target Gold target, electronics, optoelectronics, military, decorative, functional film

Advantages

quality

1. reliability, price

2.restore Preparation of high purity, less impurities

3.Dense, rolling, oxidation, forming plasticizers

4.relatively high density, grain uniformity axis, consistency

Product accessories

formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice

Packing vacuum

packaging / vacuum neutral packing / special packaging outside reinforcement package

Mode of transport for