Sell SiO target

Description

Our company is a specialty manufacturer to engage in the manufacture of sputtering target materials. We can supply a variety of high quality sputtering targets for the thin film in the following industries: glass, motor, machine work, optical coating, semiconductor, optical disk, magnetic head etc. In addition to domestic market, our products have been exported to foreign market including Germany, America. The quality of target materials is deeply trusted by our customer. Our sputtering target products made by hot isostatic pressure, they have four characteristics xxxxx high purity, high density, good organizations structure, long life-span, they are the best manufacturing of magnetic control sputtering target. Metal Sputtering Targets (include Rare Earth metal Sputtering Target): Al, Sb, Bi, B, Cd, C, Ce, Cr, Co, Cu, Dy, Er, Eu, Gd, Ge, Au, C, Hf, Ho, In, Ir, Fe, La, Lu, Mg, Mn, Mo, Nd, Ni, Nb, Pd, Pt, Pr, Re, Ru, Sm, Se, Sc, Ag, Si, Ta, Tb, Tm, Sn, Ti, W, V, Yb, Y, Zr, Zn, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sc, Y Alloy Sputtering Targets: TiAl, AlCu, AlCr, AlMg, AlSi, AlSiCu, AlAg, AlV, CaNiCrFe, CaNiCrFeMoMn, CeGd, CeSm, CrSi, CoCr, CoCrMo, CoFe, CoFeB, CoNi, CoNiCr, CoPt, CoNbZr, CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo, CuGa, CuIn, CuNi, CoNiPt, CuZr, DyFe, DyFeCo, FeB, FeC, FeMn, GdFe, GdFeCo, HfFe, IrMn, IrRe, InSn, MoSi, NiAl, NiCr, NiCrSi, NdDyFeCo, NiFe, NiMn, NiNbTi, NiTi, NiV, SmCo, AgCu, AgSn, TaAl, TbDyFe, TbFe, TbFeCo, TbGdFeCo, TiNi, TiCr, WRe, WTi, WCu, ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrY, ZnAl, ZnMg Ceramic Sputtering Targets: Boride Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2, LaB6, Mo2B, Mo2B5, NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 Carbide Sputtering Targets: B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC Fluoride Sputtering Targets: AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6, SrF2, ThF4, YF3, YbF3 Ni