الوصف

1. Feature
*This equipment is for research and mass production.
*Designed to coat chemical regularly when studying of
  semi-conduct wafer, sapphire and display.
*Easy to operate for anyone.

2. Description
Substrate size: Pieces~max Ø6" **0mm
Spin speed: Max. ***0rpm
Spin acceleration: ~****0rpm/sec, max<5%
Spin motor: AC Servo Spin Motor **0W
Dimension : **0W x **0D x ***0H
Spin bowl:   Ø **0 PTFE Bottom & Top cup
Display: 7" LCD Touch screen
Program: PLC, *0 Recipes/*0 steps
Option: Auto centering, PR pump, HPO
Exhaust drain: Exhaust  Ø *0 & Waste chemical reservoir  
Power: **0VAC / **0VAC, *0Hz, *0Hz *5A