Suzhou CSE Semiconductor Equipment Techn

Wet Bench Application Developing Process Etching Process Stripping Process Cleaning Process Mask Cleaner Suitable Size 2"-8" Wafer

Application: widely used inwet chemicalprocess of chip in ICproductionand semiconductor componentsproduction; Utility: thedevice caneffec...

Use:suitable for quartz and quartz tube of diameter 255cm , length 3300cm or smaller in semiconductor, solar energyindustry Size:the entire equipmentu

This equipment isimmersioncleaning machine. mainly used forquartz tube which is used in diffusion and extension equipment andsilicon carbidetube 1.Th.

Equipment overview: Wafer drying machine has highcleanlinessspin rinsedryfunction.Mainly used forsilicon wafer, reticle, solar cells and othersimilar

the cleaning objectis2 to8 inches ofgrinding silicon wafer.The whole equipmentcontrolled byimported PLC. Throughsetting thework rhythm, tr...

1 Process; feeding, spray, etching, rinsing, etching, spray, blanking 2.Conversion between etching bath and washing is finished by imported SEW driven

Semiconductor etchingmachine(semiautomatic)(non-standard equipment) General description:suitable for etching of2 "- 8"wafer.Conversion ...

Semiconductor etchingmachine(semiautomatic)(non-standard equipment) General description:suitable for etching of2 "- 8"wafer.Conversion ...

Silicon rodcleaning machine 1.Process:Manually feeding, corrosion, water washing, overflowrinsing, ultrasound+heating, and hotnitrogen, vacuumd...