الوصف

The Annealsys MC**0 system is a *-inch ALD/CVD (Atomic Layer Deposition and Chemical Vapor Deposition) reactor especially developed to meet the requirements of research and development units.

It is designed for ALD and MOCVD processes for deposition of metal and metal alloys, oxides and nitrides.

It allows doing heteroepitaxy of oxides on single crystals wafers and polycrystalline oxides deposition on amorphous or polycrystalline substrates by ALD and MOCVD using a wide range of solid and liquid organometallic volatile precursors. The system also allows deposition of metals and nitrides.

The direct liquid injection vaporizer allows utilization of the widest range of chemical precursors

The infrared lamp furnace and the system design provide multi process capability inside the same process chamber: MOCVD, ALD, RTP and RTCVD.

The process chamber is made of a horizontal quartz tube with stainless steel flanges.

The furnace uses tubular infrared halogen lamps and provides fast ramp rates and allows in-situ annealing processes.

The horizontal motion door with the quartz tray provides easy loading and unloading of the substrate as well as of thermocouple installation.

The MC**0 can receive different type of liquid delivery and vaporization apparatus.

The system is provided with liquid distribution equipment that is designed according to the liquid precursors to be used and their chemical specifications.

The MC**0 is provided with full PC control.

Applications:
Metal and alloys, oxides, nitrides, III-V, II-VI,...
Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN, ...
Nitrides and alloys: GaN, AlN, GaAs, GaAsN...
High k Dielectrics: SrTiO3, BaTiO3, Ba(*-x)SrxTiO3 (BST)
Ferroelectrics: SBT, SBTN, PLZT, PZT,…
Superconductors: YBCO, Bi****3, Bi****2, Tl****3, …
Piezoelectrics: (Pb, Sr)(Zr,Ti)O3, Modified Lead Titanate
Metals: Pt, Cu,...
Colossal Magneto Resistance
Thermal coatings, Buffer layers, Mechanical coatings, Optics
Etc...