الوصف

The Annealsys MC**0 system is a *-inch CVD reactor especially developed to meet the requirements of research and development units. It is designed for MOCVD and ALD processes for deposition of metal and metal alloys, oxides and transition metal nitrides. It allows doing heteroepitaxy of oxides on single crystals wafers (such as YBCO/LAO, STO/MgO, MxOy/LAO…) by MOCVD using a wide range of solid and liquid organometallic precursors.

The MC**0 has a vertical cold wall reactor and it can receive different type of liquid delivery and vaporization apparatus. The system is provided with liquid distribution equipment that is designed according to the liquid precursors to be used and their chemical specifications.

The system is made of several elements assembled using flanges. It makes it very versatile and easily modifiable for custom applications.

The MC**0 has a full PC control system.