الوصف

TSU***0 mulfunction coating machine has there functions of multi-target magnetron sputtering, multi-arc ion plating and evaporation coating. This machine mainly consists of the coating chamber, circular planar target, rectangular target, multi-arc target, evaporation of water-cooling electrodes, sputtering power, multi-arc power, evaporation power, bias voltage power, ion source, turbo-molecular pump system, rotating substrate, tubular heater, carrier gas supply, cooling system, brand-new PLC electrical control system, etc. The device has functions of multi-target co-sputtering to achieve multi-purpose functions. It can manufacture conductive film, semiconductor film, insulating single or multilayer film. The machine is highly structured, full-featured, easy to operate, fast vacuum-pumping. It is applicable to develop a variety of super-hard films, wear-resistant films, corrosion-resistant films and special function films, etc. in the laboratory.







Main technical Specifications

Production    TSU***0 multi-function coating machine

Chamber    **0 mm×H**0 mm

Size of effective coating space    **0 mm×H**0 mm

Workpiece movement    Rotation speed ***0RPM, ferrofluidic seal

Magnetic control target    Circular target and rectangular target

Multi-arc target    *5mm

Evaporation source    Evaporation electrode reserved

Film types    Tools coating and decorative coating

Structure of vacuum chamber    Vertical, front-opened door and the rear pumping system, double-layer cooling water

Vacuum system    Turbo-molecular pump + mechanical pump

Ultimate vacuum    8.0×***5Pa

Vacuum speed    Pumped from the atmosphere to ***3Pa  *0min

Control    Vacuumize automatically

Alarm and protection    It alarms in time and executes appropriate protection measures when abnormal situations, such as water shortage, over-current, over-voltage and open circuit, happen on pumps and targets.

Optional components    Refrigeration cycle machin