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ANNEALSYS

Rue de la Vieille Poste,MONTPELLIER,France,France France

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المنتوجات: 10

Rapid Thermal Processing System : AS-One

The AS-One RTP system can process samples up to 150 mm diameter. The machine has been specially developed to meet the requirements of universities, re

Rapid Thermal Processing System : AS-Micro

The AS-Micro system is a three-inch rapid thermal processor dedicated research applications. It can process up to 3-inch diameter wafers. A 3-inch dia

ALD/MOCVD system MC050

The Annealsys MC050 system is a 2-inch ALD/CVD (Atomic Layer Deposition and Chemical Vapor Deposition) reactor especially developed to meet the requir

ALD/MOCVD system MC100

The Annealsys MC100 system is a 4-inch CVD reactor especially developed to meet the requirements of research and development units. It is designed for

Sputtering

Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition. Annealsys offer additional process solutions with ALD machi

Etching

Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition. Annealsys offer additional process solutions with ALD machi

UV-Ozone Cleaning

Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition. Annealsys offer additional process solutions with ALD machi

Sputtering Evaporation

Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition. Annealsys offer additional process solutions with ALD machi

ALD Plasma

Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition. Annealsys offer additional process solutions with ALD machi

LPCVD

Annealsys manufactures systems for Rapid Thermal Processing and Chemical Vapor Deposition. Annealsys offer additional process solutions with ALD machi

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